METHOD OF MONITORING SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A method for monitoring a substrate processing apparatus is provided to easily determine an abnormal cause in substrate processing apparatus by displaying control functions corresponding to a problem caused in a control program with a ladder diagram and an instruction list. CONSTITUTION: Factor data used in a control program is generated and saved(S100). Function data including a command and a memory address of factors used in the control function are generated and saved by using the factor data(S200). The sequence information of the control functions and the function data corresponding to malfunctions are obtained(S300). The sequence information of the control functions is showed as a ladder diagram and an instruction list by using obtained function data(S400).