| 摘要 |
PURPOSE: An apparatus for drying a wafer is provided to uniformly dry wafers by arranging heating units arranged between wafers. CONSTITUTION: An apparatus for drying a wafer includes a bass, a wafer guide, and plurality of lamps(300). The wafer guide is arranged in an inner side of the bass and supports a plurality of wafers. A plurality of lamps is respectively arranged between the wafers. A transport unit(500) transports the heating unit to be opposite to the wafers to a diametric direction of the wafers. Slots wafer respectively corresponding to edges of the wafers is included in wafer guides.
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