| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a charged particle beam lithography device in which drawing time can be reduced when multiple drawing is performed. <P>SOLUTION: The lithography device 100 comprises a shot division unit 62 which divides a figure defined by layout data into a plurality of shot figures having a size that can be irradiated with a charged particle beam in one shot, a shot data generation unit 79 which generates each shot data of the shot figure of multiple shots for each shot figure so that the multiplicity of multiple drawing becomes variable for each shot figure, and a drawing unit 150 which draws the shot figures while superimposing on a sample by using a charged particle beam according to the number of times of each shot data generated for the shot figures. <P>COPYRIGHT: (C)2012,JPO&INPIT |
