发明名称 PHOTOSENSITIVE MODIFIED POLYIMIDE RESIN COMPOSITION AND USE THEREOF
摘要 Disclosed are: a photosensitive modified polyimide resin composition having photo-fabrication property, which is excellent in the electric properties and adhesion as well as in the heat resistance, flexibility, bending property, low warping, chemical resistance and storage stability; a resin film formed from the composition; and a printed circuit board, flexible printed circuit board (FPC) and the like which comprises the film as an insulating protective film and/or interlayer insulation film. The photosensitive modified polyimide resin composition comprises a modified polyimide of a specific structure having a flexible structure such as polycarbonate; a photosensitizer; a curing agent; and a solvent.
申请公布号 US2012097435(A1) 申请公布日期 2012.04.26
申请号 US201013318058 申请日期 2010.04.30
申请人 GOSHIMA TOSHIYUKI;WIN MAW SOE;SEGAWA SIGEMASA;KYO EIKA;PI R&D CO., LTD. 发明人 GOSHIMA TOSHIYUKI;WIN MAW SOE;SEGAWA SIGEMASA;KYO EIKA
分类号 H05K1/03;G03F7/004;G03F7/008;G03F7/022;G03F7/20 主分类号 H05K1/03
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