发明名称 METHODS OF FABRICATING SEMICONDUCTOR STRUCTURES AND DEVICES WITH STRAINED SEMICONDUCTOR MATERIAL
摘要 Methods of fabricating semiconductor structures and devices include bonding a seed structure to a substrate using a glass. The seed structure may comprise a crystal of semiconductor material. Thermal treatment of the seed structure bonded to the substrate using the glass may be utilized to control a strain state within the seed structure. The seed structure may be placed in a state of compressive strain at room temperature. The seed structure bonded to the substrate using the glass may be used for growth of semiconductor material, or, in additional methods, a seed structure may be bonded to a first substrate using a glass, thermally treated to control a strain state within the seed structure and a second substrate may be bonded to an opposite side of the seed structure using a non-glassy material.
申请公布号 US2012100692(A1) 申请公布日期 2012.04.26
申请号 US201213343530 申请日期 2012.01.04
申请人 LETERTRE FABRICE;SOITEC 发明人 LETERTRE FABRICE
分类号 H01L21/20;H01L21/30 主分类号 H01L21/20
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