| 发明名称 |
PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, AS WELL AS PHOTOSENSITIVE FILM USING THE SAME, PATTERN FORMING METHOD, PATTERN FILM, LOW REFRACTIVE INDEX FILM, ANTIREFLECTION FILM, OPTICAL DEVICE AND SOLID STATE IMAGING ELEMENT |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition with which a pattern with a low refractive index, excellent film strength and few development defects can be formed at high resolution, a pattern forming material, as well as a photosensitive film using it, a pattern forming method, a pattern film, a low refractive index film, an antireflection film, an optical device and a solid state imaging element. <P>SOLUTION: A photosensitive composition contains (A) hollow or porous particles, (B) an alkali soluble particle dispersant having a group capable of chemically binding to the particles (A), (C) a compound which generates an active species upon irradiation with an actinic ray or radiation, and (D) a binder of which solubility in an alkali developer is reduced by an action of the active species. <P>COPYRIGHT: (C)2012,JPO&INPIT |
