| 摘要 |
A method of forming a water repelling film, includes: a thin film forming step of forming, on a base member, a thin film mainly having Si—O bonds and having hydrophobic substituent groups directly bonded to silicon, using a starting material which is a gas at normal temperature and atmospheric pressure; an irradiation step of irradiating the thin film obtained in the thin film forming step with excitation light in such a manner that the hydrophobic substituent groups are left and OH groups are present in the thin film; and an application step of applying a silane coupling agent onto the thin film obtained in the irradiation step. |
