| 发明名称 |
COMPOSITION FOR FORMING ALUMINA FILM AND METHOD FOR FORMING ALUMINA FILM |
| 摘要 |
<p>Provided are: a composition for forming an alumina film, which enables sufficient oxidation of aluminum even in cases where the film is thick; and a method for forming an alumina film, which uses the composition. The composition for forming an alumina film contains an aluminum compound that has a monovalent organic group having 1-12 carbon atoms and an organic solvent. The method for forming an alumina film comprises: a step wherein a composition for forming an alumina film, said composition containing an aluminum compound that has a monovalent organic group having 1-12 carbon atoms and an organic solvent, is applied over a base so that a coating film is formed thereon; and a step wherein the coating film is heated and/or irradiated with light in the presence of an oxidizing gas.</p> |
| 申请公布号 |
WO2012053436(A1) |
申请公布日期 |
2012.04.26 |
| 申请号 |
WO2011JP73633 |
申请日期 |
2011.10.14 |
| 申请人 |
JSR CORPORATION;CHUNG, KANG-GO;SAKAI, TATSUYA |
发明人 |
CHUNG, KANG-GO;SAKAI, TATSUYA |
| 分类号 |
H01L21/316;C01F7/30;C07F5/06;H01L21/8242;H01L27/108 |
主分类号 |
H01L21/316 |
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