发明名称 |
MOLDING DIE FOR MANUFACTURING NANOSTRUCTURE FORMATION, AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a molding die for manufacturing nanostructure formation having scratch resistance and durability and the like by adjusting the thickness of an anodic oxide film thereof, and to provide a method for manufacturing the same. <P>SOLUTION: The molding die is used for manufacturing the nanostructure formation using a nanostructure, and has the anodic oxide film formed on a surface of an aluminum material. The anodic oxide film has pores at an average period of ≥50 nm and ≤400 nm at least in one direction. Each pore is formed of a taper-shaped part and a fine pore shaped part therebelow. The taper shaped part has a taper shape which is widely open on the surface of the anodic oxide film, and gradually narrowed toward a deeper part. The fine pore shaped part has the fine pore shape of substantially equal diameter. The anodic oxide film also has a fine pore shaped layer which is continuous to the lower side of the taper shape layer having the taper shape part and includes the fine pore shaped part. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012082470(A) |
申请公布日期 |
2012.04.26 |
申请号 |
JP20100229167 |
申请日期 |
2010.10.10 |
申请人 |
DNP FINE CHEMICALS CO LTD;NIPPON SHINKAN KK |
发明人 |
SATO KAZUYA;WATANABE YUTAKA;MINEMURA KAZUAKI |
分类号 |
C25D11/12;B29C33/38;B29C59/02;C25D11/04;C25D11/10;C25D11/24 |
主分类号 |
C25D11/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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