发明名称 |
LAMINATE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a laminate manufacturing method capable of suppressing a metal residue from occurring during etching processing and acquiring a laminate having a plating film including patterned copper excellent in linearity and adhesion. <P>SOLUTION: A manufacturing method of a laminate having a plating film including patterned copper comprises: a polymer layer formation step of bringing a polymer 14 having a functional group forming interaction with a copper ion and a polymerizable group in contact with a substrate 10 and forming a polymer layer by applying energy; a catalyst application step of bringing a plating catalyst liquid including the copper ion and exceeding pH3.0 in contact with the polymer layer and applying the copper ion to the polymer layer; a first alkaline aqueous solution contact step of bringing the polymer layer to which the copper ion was applied in contact with an alkaline aqueous solution; a plating step of applying at least copper plating to the polymer layer and acquiring a plating film 16 including copper; and a pattern formation step of etching the plating film including the copper into a pattern shape and forming a plating film 18 including the patterned copper. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012084640(A) |
申请公布日期 |
2012.04.26 |
申请号 |
JP20100228417 |
申请日期 |
2010.10.08 |
申请人 |
FUJIFILM CORP |
发明人 |
TATEISHI TOMOYOSHI;KUBOTA YUTAKA |
分类号 |
H05K3/18;B32B15/08;H05K3/06;H05K3/38 |
主分类号 |
H05K3/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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