发明名称 LAMINATE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a laminate manufacturing method capable of suppressing a metal residue from occurring during etching processing and acquiring a laminate having a plating film including patterned copper excellent in linearity and adhesion. <P>SOLUTION: A manufacturing method of a laminate having a plating film including patterned copper comprises: a polymer layer formation step of bringing a polymer 14 having a functional group forming interaction with a copper ion and a polymerizable group in contact with a substrate 10 and forming a polymer layer by applying energy; a catalyst application step of bringing a plating catalyst liquid including the copper ion and exceeding pH3.0 in contact with the polymer layer and applying the copper ion to the polymer layer; a first alkaline aqueous solution contact step of bringing the polymer layer to which the copper ion was applied in contact with an alkaline aqueous solution; a plating step of applying at least copper plating to the polymer layer and acquiring a plating film 16 including copper; and a pattern formation step of etching the plating film including the copper into a pattern shape and forming a plating film 18 including the patterned copper. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012084640(A) 申请公布日期 2012.04.26
申请号 JP20100228417 申请日期 2010.10.08
申请人 FUJIFILM CORP 发明人 TATEISHI TOMOYOSHI;KUBOTA YUTAKA
分类号 H05K3/18;B32B15/08;H05K3/06;H05K3/38 主分类号 H05K3/18
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