| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inspection device, which is applied to an inspection of a sample on which a predefined pattern is repeatedly arrayed, capable of accurately controlling scanning position of an electron beam in real time, since there occurs an error between a position to which the electron beam should be irradiated and a position to which the electron beam is actually irradiated due to drift of the electron beam or the like, and the error must be reduced in the inspection device. <P>SOLUTION: An inspection device, which is applied to an inspection of a sample on which a predefined pattern is arrayed in a predefined period, determines a deviation amount between a position to which a primary electron beam has been irradiated and a target position of that irradiation based on a position of pattern obtained from a detection signal and a positional information of the pattern including a known position of the pattern. Further, using the deviation amount, a correction value of the irradiation position of the primary electron beam is outputted. <P>COPYRIGHT: (C)2012,JPO&INPIT |
