| 发明名称 |
RESIST PATTERN IMPROVING MATERIAL, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE |
| 摘要 |
To provide a resist matter improving material containing C4-11 linear alkanediol, and water.
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| 申请公布号 |
US2012100488(A1) |
申请公布日期 |
2012.04.26 |
| 申请号 |
US201113180784 |
申请日期 |
2011.07.12 |
| 申请人 |
KOZAWA MIWA;NOZAKI KOJI;FUJITSU LIMITED |
发明人 |
KOZAWA MIWA;NOZAKI KOJI |
| 分类号 |
G03F7/38;C08K5/053;C09D7/12 |
主分类号 |
G03F7/38 |
| 代理机构 |
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代理人 |
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| 地址 |
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