发明名称 Semiconductor Production Equipment Including Fluorine Gas Generator
摘要 A semiconductor production equipment includes a fluorine gas generator, and a detoxification device for combusting a waste gas containing a fluorine-based gas. The fluorine gas generator is configured to electrolyze hydrogen fluoride in an electrolytic bath of a molten salt containing hydrogen fluoride to generate a main product gas whose major component is fluorine gas at an anode side and generate a by-product gas whose major component is hydrogen at a cathode side. The semiconductor production equipment further includes a lead-out line for introducing the by-product gas generated from the fluorine gas generator to the detoxification device. The detoxification device includes a mechanism for using the by-product gas sent to the detoxification device as a combustion agent.
申请公布号 US2012100491(A1) 申请公布日期 2012.04.26
申请号 US201013122643 申请日期 2010.01.15
申请人 CENTRAL GLASS COMPANY, LIMITED 发明人 MORI ISAMU;YAO AKIFUMI;TANAKA KENJI;MIYAZAKI TATSUO
分类号 F23J15/00;C23C14/34;C23C16/00;C25B1/24;H01L21/02 主分类号 F23J15/00
代理机构 代理人
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