发明名称 |
Semiconductor Production Equipment Including Fluorine Gas Generator |
摘要 |
A semiconductor production equipment includes a fluorine gas generator, and a detoxification device for combusting a waste gas containing a fluorine-based gas. The fluorine gas generator is configured to electrolyze hydrogen fluoride in an electrolytic bath of a molten salt containing hydrogen fluoride to generate a main product gas whose major component is fluorine gas at an anode side and generate a by-product gas whose major component is hydrogen at a cathode side. The semiconductor production equipment further includes a lead-out line for introducing the by-product gas generated from the fluorine gas generator to the detoxification device. The detoxification device includes a mechanism for using the by-product gas sent to the detoxification device as a combustion agent. |
申请公布号 |
US2012100491(A1) |
申请公布日期 |
2012.04.26 |
申请号 |
US201013122643 |
申请日期 |
2010.01.15 |
申请人 |
CENTRAL GLASS COMPANY, LIMITED |
发明人 |
MORI ISAMU;YAO AKIFUMI;TANAKA KENJI;MIYAZAKI TATSUO |
分类号 |
F23J15/00;C23C14/34;C23C16/00;C25B1/24;H01L21/02 |
主分类号 |
F23J15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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