SUBSTRATE HEATING APPARATUS AND SUBSTRATE HEATING METHOD

摘要

PURPOSE: An apparatus for heating a substrate and a heating method thereof are provided to minimize the temperature differences between a central region and a peripheral region of a substrate by heating the substrate so that temperatures at an edge of the substrate is higher than the temperatures at the central region. CONSTITUTION: A plurality of substrate support members(200) supports a substrate loaded on a chamber. A heater module(300) heats the substrate supported by the plurality of substrate support members according to a plurality of areas. A heater controller(500) controls a heater module so that the temperature of the substrate is controlled by the plurality of areas. The heater controller controls the heater module. The heater module is arranged on top or lower parts of the substrate.