发明名称 |
MULTI-FUNCTIONAL NON-VOLATILE MEMORY DEVICE AND FABRICATION METHOD OF THE SAME |
摘要 |
<p>PURPOSE: A multi-functional non-volatile memory device and a fabrication method thereof are provided to prevent a short channel effect by forming a channel region having a recess structure. CONSTITUTION: A channel region(300) is formed into a recess structure. A first resistance variable insulating layer(210) is formed on a substrate on which the channel region is formed. A resistance variable charge trapping layer(220) is formed on the first resistance variable insulating layer. The resistance variable charge trapping layer is composed of a resistance variable domain(222) and a pair of charge trapping domains(224a,224b). A second resistance variable insulating layer(230) is formed on the resistance variable charge trapping layer. A gate layer(240) is formed on the second resistance variable insulating layer.</p> |
申请公布号 |
KR101140271(B1) |
申请公布日期 |
2012.04.26 |
申请号 |
KR20100116939 |
申请日期 |
2010.11.23 |
申请人 |
KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION |
发明人 |
KIM, TAE GEUN;AN, HO MYOUNG |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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