METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To simplify a process for manufacturing a semiconductor device and to suppress oxidation of a metal element-containing film.

SOLUTION: A method for manufacturing a semiconductor device comprises the steps of: carrying a substrate provided with a metal element-containing film and an insulating film formed on the metal element-containing film into a processing chamber, and supporting the substrate by a substrate support provided in the processing chamber; supplying a reaction gas containing excited-state oxygen and either or both of excited-state hydrogen and excited-state nitrogen onto the substrate in the processing chamber to process the substrate; and carrying out the substrate from the processing chamber.

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