| 摘要 |
PURPOSE: A radiation ray-sensitive resin composition, a curing film, an array substrate, and a method for forming the same are provided to improve surface hardness, solvent resistance characteristic, and relative permittivity. CONSTITUTION: A radiation ray-sensitive resin composition includes copolymer, quinine diazide compound, and a hardener. The copolymer includes a first structural unit with carboxylic group and a second structural unit with epoxy group. The hardener is at least one selected from compound represented by chemical formula 1, compound represented by chemical formula 2, tertiary amine compound, amine salt, phosphonium salt, amidine salt, amide compound, ketimine compound, block isocyanate compound, imidazole ring containing compound, and inclusion compound. In chemical formula 1, R1 to R6 are respectively hydrogen atom, electron attracting group, or amino group; at least one of R1 to R6 is electron attracting group; at least one of R1 to R6 is amino group; and a part or whole of hydrogen atoms in the amino group is capable of being substituted with C1 to C6 alkyl group. In chemical formula 2, R7 to R16 is respectively hydrogen atom, electron attracting group, or amino group; at least one of R7 to R16 is amino group; a part or whole of hydrogen atoms in the amino group is capable of being substituted with C1 to C6 alkyl group; A is single bond, carbonyl group, carbonyloxy group, carbonylmethylene group, sulfonyl group, sulfinyl group, methylene group, or C2 to C6 alkylene group; a part or whole of hydrogen atoms in the methylene group and the alkylene group is capable of being substituted with cyano group, halogen atoms, or fluoroalkyl group. |
