| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin, light-weight and break-proof liquid crystal display device in significantly reduced manufacturing processes at low cost. <P>SOLUTION: Etching of a semiconductor layer and formation of contact holes for connecting pixel electrodes with drain electrodes are performed in the same photolithography process and etching process when forming an element region on a substrate via a release layer. Further, by peeling the element region from the substrate to translocate the element region to a first support having high toughness and sandwiching a liquid crystal element with the first support and a second support having high toughness, a thin, light-weight and break-proof liquid crystal display device can be manufactured in significantly reduced manufacturing processes at low cost. <P>COPYRIGHT: (C)2012,JPO&INPIT |
