| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a Cu-Ga alloy sputtering target containing an alkali metal without using an elemental alkali metal which is difficult to handle, and a Cu-Ga alloy sputtering target obtained by the production method. <P>SOLUTION: A mixed powder prepared by mixing a Cu-Ga alloy powder containing at least gallium and copper and an alkali metal-containing organic matter is sintered to produce a Cu-Ga alloy sputtering target containing 0.01-5 mass% of the alkali metal. <P>COPYRIGHT: (C)2012,JPO&INPIT |
