| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus, etc. which can raise the temperature on the peripheral part of the substrate to be processed in a short time to heighten the efficiency of processing by a chemical solution. <P>SOLUTION: A liquid processing apparatus 1, which is designed to carry out liquid processing by supplying a chemical solution from a chemical supply part 62 to the target substrate to be processed, W, which rotates around a vertical axis, has a gas supply port 51 provided in a cover member 5 which is disposed on the top face of the target substrate W oppositely thereto via space, so that gas is supplied from the gas supply port 51 toward the space. This gas flows out from the space via a gap between a protrusion provided on the peripheral part of the cover member 51 protrusively toward a lower side and the target substrate W. Further, this space has a lamp heater 61 for heating the peripheral part of the target substrate W disposed therein along a circumferential direction of the target substrate W, where a chemical solution fed from the chemical supply part 62 is supplied to a place closer to the peripheral part than a position at which the lamp heater 61 is disposed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
