PLASMA CVD FILM-FORMING APPARATUS, FILM-FORMING METHOD, GAS-BARRIER LAMINATED FILM

摘要

PROBLEM TO BE SOLVED: To provide a plasma CVD film-forming apparatus capable of performing static elimination in a suitable position in order to perform plasma CVD film-forming excellently.

SOLUTION: The plasma CVD film-forming apparatus 1 which continuously forms a film on a base material 100 while continuously conveying the long base material 100 is provided with: a first film-forming roll 61 wrapping and conveying the base material 100; a second film-forming roll 62 arranged opposite to the first film-forming roll 61; and a static eliminator eliminating static electricity charged on a film-forming surface 100a, wherein the film-forming surface 100a of the base material is a surface that faces the second film-forming roll 62 of the base material 100 wrapped on the first film-forming roll 61. A gap between the first film-forming roll 61 and the second film forming roll 62 is a film-forming space where plasma CVD film-forming is performed on the film-forming surface 100a, and the static eliminator includes a first static eliminator 81 arranged upstream of the film-forming space in a conveying direction of the base material 100.

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