发明名称 CONTIGUOUS AND VIRTUALLY CONTIGUOUS AREA EXPANSION OF SEMICONDUCTOR SUBSTRATES
摘要 Substrates are processed, with a high degree of topography, to produce a variety of semiconductors or other devices and are then stretched out, substantially flat, to achieve a significant increase in surface area. Devices made from a contiguous structure of a single, active crystalline material or from non-contiguous structures of multiple materials, such as a combination of dielectrics, thin film metals and active crystalline semiconductors, are fabricated by utilizing anisotropically etched, high aspect ratio configurations of the active material. The structure is then stretched out to achieve a significant increase in surface area, thereby enabling a substantial reduction in the cost of the substrate materials per unit area in the final product.
申请公布号 US2012097971(A1) 申请公布日期 2012.04.26
申请号 US201113281356 申请日期 2011.10.25
申请人 JACOBS SCOTT L. 发明人 JACOBS SCOTT L.
分类号 H01L29/20;H01L21/306;H01L29/06 主分类号 H01L29/20
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