| 摘要 |
<p>The present invention relates to a composition for the production of oxide thin films and a method for producing oxide thin films by using said composition. More specifically, the present invention relates to: (1) a composition for the production of complex oxide thin films and a method for producing oxide thin films by using said composition (first aspect of the present invention); (2) a composition for the production of zinc oxide thin films, a composition for the production of doped zinc oxide thin films, and a method for producing zinc oxide thin films by using said compositions (second aspect of the present invention); and (3) a composition for the production of zinc oxide thin films, a composition for the production of doped zinc oxide thin films, and a method for producing zinc oxide thin films by using said compositions (third aspect of the present invention).</p> |
| 申请人 |
TOSOH FINECHEM CORPORATION;INABA, KOICHIRO;TOYOTA, KOUJI;HAGA, KENICHI;TOKUDOME, KOICHI;YOSHINO, KENJI;TAKEMOTO, YUJIN |
发明人 |
INABA, KOICHIRO;TOYOTA, KOUJI;HAGA, KENICHI;TOKUDOME, KOICHI;YOSHINO, KENJI;TAKEMOTO, YUJIN |
