| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scanning exposure device, an exposure method which uses the scanning exposure device, and a device manufacturing method capable of reducing a switching operation load of a variable molding mask required per substrate. <P>SOLUTION: A scanning exposure device comprises: an illumination system 21; a reflection mirror 23; a spatial light modulator (SLM) 24 having a plurality of SLM mirrors; a projection optical system 22 which forms an exposure pattern on a projection region based on the mask pattern formed by an SLM mirror; a scanning stage 11 which scans a substrate S for the projection region; and an SLM driving device 25 which controls the SLM 24. When the projection region is not in the dummy exposure region located in the periphery of the substrate S, the SLM driving device 25 scans the selection range of a dimming element including a drive target at reference scanning intervals tailored to scanning of the substrate S. When the projection region is in the dummy exposure region, the SLM driving device fixes the dimming state of the SLM 24 to make the scanning intervals of the selection range of the dimming element including the drive target longer than the reference scanning intervals. <P>COPYRIGHT: (C)2012,JPO&INPIT |
