发明名称 |
POLYAMIC ACID VARNISH, POLYIMIDE VARNISH, METHOD FOR PRODUCING THESE, AND CONNECTION STRUCTURE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide varnish excellent in storage stability and exhibiting preferable adhesiveness not only for the surface of a fluorinated resin not implemented of modifying treatments such as excimer laser irradiation, but also for the surfaces of polyolefin and polyimide. <P>SOLUTION: The polyimide varnish includes polyimide obtained by polycondensation cyclization of an acid dianhydride and a diamine, a fluorinated resin and an organic solvent dissolvable of these. The product obtained by polycondensation cyclization of the acid dianhydride and the diamine in a fluorinated resin solution obtained by dissolving the fluorinated resin in the organic solvent is used as the polyimide. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012082329(A) |
申请公布日期 |
2012.04.26 |
申请号 |
JP20100230231 |
申请日期 |
2010.10.13 |
申请人 |
SONY CHEMICAL & INFORMATION DEVICE CORP |
发明人 |
SUNAGA TOMOYASU;IWATA MIZUO;ITO MAKIYA;YUN KYUNGSUNG;ISHII JUNICHI |
分类号 |
C08L79/04;C08L27/12;C09J127/12;C09J179/08 |
主分类号 |
C08L79/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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