发明名称 POLYAMIC ACID VARNISH, POLYIMIDE VARNISH, METHOD FOR PRODUCING THESE, AND CONNECTION STRUCTURE
摘要 <P>PROBLEM TO BE SOLVED: To provide varnish excellent in storage stability and exhibiting preferable adhesiveness not only for the surface of a fluorinated resin not implemented of modifying treatments such as excimer laser irradiation, but also for the surfaces of polyolefin and polyimide. <P>SOLUTION: The polyimide varnish includes polyimide obtained by polycondensation cyclization of an acid dianhydride and a diamine, a fluorinated resin and an organic solvent dissolvable of these. The product obtained by polycondensation cyclization of the acid dianhydride and the diamine in a fluorinated resin solution obtained by dissolving the fluorinated resin in the organic solvent is used as the polyimide. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012082329(A) 申请公布日期 2012.04.26
申请号 JP20100230231 申请日期 2010.10.13
申请人 SONY CHEMICAL & INFORMATION DEVICE CORP 发明人 SUNAGA TOMOYASU;IWATA MIZUO;ITO MAKIYA;YUN KYUNGSUNG;ISHII JUNICHI
分类号 C08L79/04;C08L27/12;C09J127/12;C09J179/08 主分类号 C08L79/04
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