发明名称 |
DETECTION OF CONTAMINATION IN EUV SYSTEMS |
摘要 |
A sensor for sensing contamination in an application system is disclosed. In one aspect, the sensor comprises a capping layer. The sensor is adapted to cause a first reflectivity change upon initial formation of a first contamination layer on the capping layer when the sensor is provided in the system. The first reflectivity change is larger than an average reflectivity change upon formation of a thicker contamination layer on the capping layer and larger than an average reflectivity change upon formation of an equal contamination on the actual minors of the optics of the system. |
申请公布号 |
US2012099092(A1) |
申请公布日期 |
2012.04.26 |
申请号 |
US201113282175 |
申请日期 |
2011.10.26 |
申请人 |
JONCKHEERE RIK;GOETHALS ANNE-MARIE;LORUSSO GIAN FRANCESCO;POLLENTIER IVAN;IMEC |
发明人 |
JONCKHEERE RIK;GOETHALS ANNE-MARIE;LORUSSO GIAN FRANCESCO;POLLENTIER IVAN |
分类号 |
G01N21/55;B23P17/04;G03B27/54 |
主分类号 |
G01N21/55 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|