发明名称 |
METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL |
摘要 |
The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising: a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1 (° C.), heating the glass body after transparent vitrification at a temperature of T1+400° C. or more for 20 hours or more; and a step of cooling the glass body after the heating step up to T1−400 (° C.) from T1 (° C.) in an average temperature decreasing rate of 10° C./hr or less.
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申请公布号 |
US2012100341(A1) |
申请公布日期 |
2012.04.26 |
申请号 |
US201113299475 |
申请日期 |
2011.11.18 |
申请人 |
KOIKE AKIO;MITSUMORI TAKAHIRO;IWAHASHI YASUTOMI;OGAWA TOMONORI;ASAHI GLASS COMPANY, LIMITED |
发明人 |
KOIKE AKIO;MITSUMORI TAKAHIRO;IWAHASHI YASUTOMI;OGAWA TOMONORI |
分类号 |
C03C3/04;C03B25/00;G03F1/24 |
主分类号 |
C03C3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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