发明名称 A method for manufacturing a semiconductor device
摘要 It is an object of the present invention to form an organic transistor including an organic semiconductor having high crystallinity without loosing an interface between an organic semiconductor of a channel where carriers are spread out and a gate insulating layer and deteriorating a yield. A semiconductor device according to the present invention has a stacked structure of organic semiconductor layers, and at least the upper organic semiconductor layer is in a polycrystalline or a single crystalline state and the lower organic semiconductor layer is made of a material serving as a channel. Carrier mobility can be increased owing to the upper organic semiconductor layer having high crystallinity; thus, insufficient contact due to the upper organic semiconductor layer can be compensated by the lower organic semiconductor layer.
申请公布号 KR101139716(B1) 申请公布日期 2012.04.26
申请号 KR20110026128 申请日期 2011.03.24
申请人 发明人
分类号 H01L29/786;G02F1/136;H01L51/00 主分类号 H01L29/786
代理机构 代理人
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