发明名称 |
SEMICONDUCTOR DEVICE FOR INCLUDING BURIED CHANNEL ARRAY TRANSISTORS |
摘要 |
<p>PURPOSE: A semiconductor device for including a buried channel array transistor is provided to expand a contact area mutually overlapped by interposing a storage contact pad between an active area and a storage contact plug. CONSTITUTION: Gates define source regions and drain regions in active areas wile being crossed with the active areas. An inter-layer insulating film is formed on a substrate(110). Bit line contact plugs(340c) touches with the drain regions passing through the inter-layer insulating film. First bit line structures and second bit line structures are formed on the inter-layer insulating film. The first bit line structures include a first bit line spacer(380x) covering up a first bit line conductive pattern and the sidewall of the first bit line conductive pattern.</p> |
申请公布号 |
KR20120040003(A) |
申请公布日期 |
2012.04.26 |
申请号 |
KR20100101494 |
申请日期 |
2010.10.18 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HAN, SUNG HEE;SHIN, SOO HO |
分类号 |
H01L21/8242;H01L21/336;H01L27/108;H01L29/78 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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