发明名称 SEMICONDUCTOR DEVICE FOR INCLUDING BURIED CHANNEL ARRAY TRANSISTORS
摘要 <p>PURPOSE: A semiconductor device for including a buried channel array transistor is provided to expand a contact area mutually overlapped by interposing a storage contact pad between an active area and a storage contact plug. CONSTITUTION: Gates define source regions and drain regions in active areas wile being crossed with the active areas. An inter-layer insulating film is formed on a substrate(110). Bit line contact plugs(340c) touches with the drain regions passing through the inter-layer insulating film. First bit line structures and second bit line structures are formed on the inter-layer insulating film. The first bit line structures include a first bit line spacer(380x) covering up a first bit line conductive pattern and the sidewall of the first bit line conductive pattern.</p>
申请公布号 KR20120040003(A) 申请公布日期 2012.04.26
申请号 KR20100101494 申请日期 2010.10.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HAN, SUNG HEE;SHIN, SOO HO
分类号 H01L21/8242;H01L21/336;H01L27/108;H01L29/78 主分类号 H01L21/8242
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