| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate position adjusting system that can adjust relative positions between a substrate and a photomask with high accuracy without obstructing display even when an alignment mark is provided in the effective display area of the substrate. <P>SOLUTION: The substrate position adjusting system includes an imaging means to optically image an alignment mark formed on a substrate, an image optimizing means to optimize the obtained image, and an alignment adjusting means to finely adjust the alignment of the substrate based on the image information. The imaging means comprises inserting the substrate into between a pair of polarizing plates, projecting light through one of the polarizing plates and imaging the alignment mark through the other polarizing plate. The image optimizing means rotates at least one of the pair of polarizing plates around the optical axis so as to maximize the contrast of the imaged alignment mark. The alignment adjusting means finely adjusts the position of the substrate based on the optimized image information. The alignment mark is made of a liquid crystal material. <P>COPYRIGHT: (C)2008,JPO&INPIT |
