发明名称 WATER-BASE MANICURE COMPOSITION USING PRODUCTION OF WATER SOLUBLE RESIN
摘要 PURPOSE: An aqueous manicure composition and a method for manufacturing the same are provided to ensure non-toxicity, adhesion, and water repellency. CONSTITUTION: An aqueous manicure composition contains 30-80 wt% of resin solution; 0.1-25 wt% of organic/inorganic pigment; 0.1-5 wt% of surfactant; 0.1-3 wt% of dispersion agent of (meth)acrylic acid-based copolymers, cellulose derivative, acetic acid vinyl-based polymer or polysaccharides; 0.1-3 wt% of thickening agent selected among (meth)acrylic acid-based copolymers, polyamides, polyurethanes, cellulose derivatives, polysaccharides, acetic acid vinyl-based polymer organic system and inorganic system silica, and montmorillonite; 0.1-3 wt% of wax selected from natural wax emulsion, paraffin-based wax emulsion, polyethylene-based emulsion; and 0.1-1 wt% of anti-foaming agent.
申请公布号 KR20120039080(A) 申请公布日期 2012.04.25
申请号 KR20100100571 申请日期 2010.10.15
申请人 KOSAM CORPORATION LTD. 发明人 YOON, HAENG KYUN;JEON, JEA HYUN
分类号 A61K8/37;A61K8/73;A61K8/87;A61Q3/00 主分类号 A61K8/37
代理机构 代理人
主权项
地址