发明名称 |
CARBAZOLE NOVOLAK RESIN |
摘要 |
<p>There is provided a resist underlayer film having heat resistance that is used for a lithography process in the production of semiconductor devices, and a high refractive index film having transparency that is used for an electronic device. A polymer comprising a unit structure of Formula (1):
wherein each of R 1 , R 2 , R 3 , and R 5 may be a hydrogen atom, R 4 may be phenyl group or naphthyl group. A resist underlayer film forming composition comprising the polymer, and a resist underlayer film formed from the composition. A high refractive index film forming composition comprising the polymer, and a high refractive index film formed from the composition.</p> |
申请公布号 |
EP2444431(A1) |
申请公布日期 |
2012.04.25 |
申请号 |
EP20100789529 |
申请日期 |
2010.06.16 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
SAITO, DAIGO;OKUYAMA, HIROAKI;MUSASHI, HIDEKI;SHINJO, TETSUYA;HASHIMOTO, KEISUKE |
分类号 |
C08G16/02;G03F7/11;G03F7/26 |
主分类号 |
C08G16/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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