发明名称 Vapor deposition apparatus and process for continuous deposition of a thin film layer on a substrate
摘要 An apparatus and related process are provided for vapor deposition of a sublimated source material as a thin film on a photovoltaic (PV) module substrate. A receptacle is disposed within a vacuum head chamber and is configured for receipt of a source material. A heated distribution manifold is disposed below the receptacle and includes a plurality of passages defined therethrough. The receptacle is indirectly heated by the distribution manifold to a degree sufficient to sublimate source material within the receptacle. A molybdenum distribution plate is disposed below the distribution manifold and at a defined distance above a horizontal plane of a substrate conveyed through the apparatus. The molybdenum distribution plate includes a pattern of holes therethrough that further distribute the sublimated source material passing through the distribution manifold onto the upper surface of the underlying substrate. The molybdenum distribution plate includes greater than about 75% by weight molybdenum.
申请公布号 US8163089(B2) 申请公布日期 2012.04.24
申请号 US20090639043 申请日期 2009.12.16
申请人 RATHWEG CHRISTOPHER;REED MAX WILLIAM;PAVOL MARK JEFFREY;PRIMESTAR SOLAR, INC. 发明人 RATHWEG CHRISTOPHER;REED MAX WILLIAM;PAVOL MARK JEFFREY
分类号 H01L31/18 主分类号 H01L31/18
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