发明名称 Methods of forming metal-containing structures, and methods of forming germanium-containing structures
摘要 Some embodiments include methods of forming metal-containing structures. A first metal-containing material may be formed over a substrate. After the first metal-containing material is formed, and while the substrate is within a reaction chamber, hydrogen-containing reactant may be used to form a hydrogen-containing layer over the first metal-containing material. The hydrogen-containing reactant may be, for example, formic acid and/or formaldehyde. Any unreacted hydrogen-containing reactant may be purged from within the reaction chamber, and then metal-containing precursor may be flowed into the reaction chamber. The hydrogen-containing layer may be used during conversion of the metal-containing precursor into a second metal-containing material that forms directly against the first metal-containing material. Some embodiments include methods of forming germanium-containing structures, such as, for example, methods of forming phase change materials containing germanium, antimony and tellurium.
申请公布号 US8163341(B2) 申请公布日期 2012.04.24
申请号 US20080273737 申请日期 2008.11.19
申请人 QUICK TIMOTHY A.;MARSH EUGENE P.;MICRON TECHNOLOGY, INC. 发明人 QUICK TIMOTHY A.;MARSH EUGENE P.
分类号 C23C16/00;C23C16/06;C23C16/18 主分类号 C23C16/00
代理机构 代理人
主权项
地址