发明名称 |
Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof |
摘要 |
A method for identifying a stabilized plasma within a processing chamber of a plasma processing system is provided. The method includes executing a strike step within the processing chamber to generate a plasma. The strike step includes applying a substantially high gas pressure within the processing chamber and maintaining a low radio frequency (RF) power within the processing chamber. The method also includes employing a probe head to collect a set of characteristic parameter measurements during the strike step, the probe head being on a surface of the processing chamber, wherein the surface is within close proximity to a substrate surface. The method further includes comparing the set of characteristic parameter measurements against a pre-defined range. If the set of characteristic parameter measurements is within the pre-defined range, the stabilized plasma exists. |
申请公布号 |
US8164349(B2) |
申请公布日期 |
2012.04.24 |
申请号 |
US20090498936 |
申请日期 |
2009.07.07 |
申请人 |
BOOTH JEAN-PAUL;KEIL DOUGLAS L.;LAM RESEARCH CORPORATION |
发明人 |
BOOTH JEAN-PAUL;KEIL DOUGLAS L. |
分类号 |
G01R27/26;G01R31/08 |
主分类号 |
G01R27/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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