发明名称 Multi-purpose poly edge test structure
摘要 Multi-purpose poly edge test structure. According to an embodiment, the present invention provides a test structure. The test structure includes a doped silicon substrate, the doped silicon substrate being grounded, the doped silicon substrate including a first gate structure and a second gate structure, the first and second gate structures overlaying the doped silicon substrate. The test structure also includes a first conducting pad being electrically coupled to the first gate structure. The test structure also includes a second conducting pad being electrically coupled to the second gate structure.
申请公布号 US8164091(B2) 申请公布日期 2012.04.24
申请号 US20080211615 申请日期 2008.09.16
申请人 SHI WEN;RUAN WEI WEI;SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION 发明人 SHI WEN;RUAN WEI WEI
分类号 H01L23/58 主分类号 H01L23/58
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