发明名称 HALL CROSS STRUCTURE FOR CONTROL THE ANOMALOUS HALL EFFECT THROUGH COMPRESSIVE STRAIN
摘要 <p>PURPOSE: A hole cross structure for controlling an anomalous hole effect by using the change of a compressive strain is provided to easily develop a nonvolatile memory with high integration and low power consumption by controlling the anomalous hole effect according to the change of the compressive strain of a hole cross. CONSTITUTION: A sacrificial layer(1) is formed by an etching process. A hole cross(2) passes through the upper side of the sacrificial layer. The hole cross is formed by mutually intersecting beams(3). A piezo material is deposited on the upper side of the beam.</p>
申请公布号 KR20120038310(A) 申请公布日期 2012.04.23
申请号 KR20100100000 申请日期 2010.10.13
申请人 SNU R&DB FOUNDATION 发明人 PARK YUN DANIEL;YANG, CHAN UK;KIM, TAI HOON
分类号 H01L27/10;H01L21/302;H01L21/8247;H01L27/115 主分类号 H01L27/10
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