发明名称 |
HALL CROSS STRUCTURE FOR CONTROL THE ANOMALOUS HALL EFFECT THROUGH COMPRESSIVE STRAIN |
摘要 |
<p>PURPOSE: A hole cross structure for controlling an anomalous hole effect by using the change of a compressive strain is provided to easily develop a nonvolatile memory with high integration and low power consumption by controlling the anomalous hole effect according to the change of the compressive strain of a hole cross. CONSTITUTION: A sacrificial layer(1) is formed by an etching process. A hole cross(2) passes through the upper side of the sacrificial layer. The hole cross is formed by mutually intersecting beams(3). A piezo material is deposited on the upper side of the beam.</p> |
申请公布号 |
KR20120038310(A) |
申请公布日期 |
2012.04.23 |
申请号 |
KR20100100000 |
申请日期 |
2010.10.13 |
申请人 |
SNU R&DB FOUNDATION |
发明人 |
PARK YUN DANIEL;YANG, CHAN UK;KIM, TAI HOON |
分类号 |
H01L27/10;H01L21/302;H01L21/8247;H01L27/115 |
主分类号 |
H01L27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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