| 摘要 |
PURPOSE: A real time correction method and apparatus of a digital lithographic pattern are provided to obtain a lithographic pattern wanting in spite of the deformation of a substrate by processing a digital lithographic process based on corrected digital lithographic pattern data. CONSTITUTION: A video input part is inputted the location of a plurality of alignment marks arranged on the top of the substrate. A revising part divides the substrate into a plurality of first polygonal areas including a portion among the plurality of alignment marks. The video input part is inputted the location of the plurality of alignment marks which are rearranged on the transformed substrate. The revising part divides the substrate into a plurality of second polygonal areas including a portion among the plurality of alignment marks. The revising part changes the plurality of first polygonal areas in order to accord with the plurality of second polygonal areas. The revising part revises pattern data which is data included the first polygonal area based on each conversion of the first polygonal area.
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