| 摘要 |
<p>A transparent conductive laminate includes: a first transparent dielectric thin film; a second transparent dielectric thin film; a transparent conductive thin film; a transparent film substrate having a thickness of 2 mum to 200 mum, and the first transparent dielectric thin film, the second transparent dielectric thin film, and the transparent conductive thin film formed on one side of the substrate in this order; a transparent pressure-sensitive adhesive layer; and a transparent base substrate bonded to another side of the transparent film substrate with a transparent pressure-sensitive adhesive layer interposed therebetween, wherein the first transparent dielectric thin film is formed by vacuum deposition, sputtering or ion plating and comprises a complex oxide containing 100 parts by weight of indium oxide, 0 to 20 parts by weight of tin oxide and 10 to 40 parts by weight of cerium oxide, a refractive index n 1 of the first transparent dielectric thin film, a refractive index n 2 of the second transparent dielectric thin film, and a refractive index n 3 of the transparent conductive thin film satisfy a relationship: n 2 <n 3 <=n 1 , and the transparent base substrate is a transparent laminated base substrate having at least two transparent base films that are laminated with the transparent pressure-sensitive adhesive layer interposed therebetween.</p> |
