| 发明名称 |
CYCLIC COMPOUND, PHOTORESIST SUBSTRATE, AND PHOTORESIST COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist material exhibiting high sensitivity, high resolution and high solubility in a solvent. <P>SOLUTION: There is provided a cyclic compound represented by formula (I) (wherein R is a substituted alkoxycarbonylphenyl group or the like; one of two R<SP POS="POST">1</SP>s on the same aromatic ring is hydrogen or the like and the other has a chain or branched structure; O-R<SP POS="POST">1</SP>is a group having the magnitude of 2.2-5.5 Å; and R<SP POS="POST">2</SP>is hydrogen or the like). <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012077077(A) |
申请公布日期 |
2012.04.19 |
| 申请号 |
JP20110196486 |
申请日期 |
2011.09.08 |
| 申请人 |
IDEMITSU KOSAN CO LTD |
发明人 |
KASHIWAMURA TAKASHI;SHIOYA HIDEAKI;OWADA TAKANORI;ISHII HIROTOSHI |
| 分类号 |
C07C65/26;C07C69/94;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
C07C65/26 |
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