| 摘要 |
PURPOSE: A method for manufacturing a rear electrode type solar cell is provided to decrease the number of unit processes by omitting a photolithography process when a p type emitter region, a front electric field layer, and a high density rear electric field layer are formed. CONSTITUTION: A p type emitter region(304) is formed on the rear of a substrate(301) by thermally processing the substrate and a BSG(Boron Silicate Glass) layer(305) is formed on the p type emitter region. Paste including an n type impurity ion is selectively printed on a preset region of the substrate. A high density rear electric field layer(307) is formed on the rear of the substrate by thermally processing the substrate. A front electric field layer(309) is formed on the front of the substrate through a thermal diffusion process. |
