发明名称 METHOD FOR FORMATION OF ALUMINUM FILM
摘要 <p>Provided is a method by which a homogeneous and dense aluminum film can be formed on a substrate more simply and more easily in comparison to a conventional method. A method for the formation of an aluminum film, which includes: an application step of applying a material which is for the formation of an aluminum film and which contains a complex composed of both an amine compound and aluminum hydride to the surface of a metal layer to form a coating, said metal layer consisting of at least one metal selected from among copper, cobalt, molybdenum, tungsten, aluminum, nickel and gold; and a curing step of subjecting the coating to heat treatment and/or photo-irradiation to form an aluminum film.</p>
申请公布号 WO2012050058(A1) 申请公布日期 2012.04.19
申请号 WO2011JP73209 申请日期 2011.10.07
申请人 JSR CORPORATION;YAMAMOTO, MASAHIRO;NISHIMURA, HIDEKI;AOKI, HIDEYUKI;SAKAI, TATSUYA 发明人 YAMAMOTO, MASAHIRO;NISHIMURA, HIDEKI;AOKI, HIDEYUKI;SAKAI, TATSUYA
分类号 C23C18/10;C23C18/02;H01L21/28;H01L21/288 主分类号 C23C18/10
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