| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a curable composition for nanoimprint exhibiting excellent mold releasability and causing no pattern collapse in a nanoimprint method, and to provide a nanoimprint method. <P>SOLUTION: In the curable composition for nanoimprint, a composition containing (A) a polymerizable compound and (B) a radical generation agent is applied onto a glass substrate under nitrogen atmosphere and irradiated with UV-rays at 100 mJ/cm<SP POS="POST">2</SP>for 3 seconds by using a metal halide ultraviolet irradiation device to obtain a hardened film having a thickness of 200 μm. Storage modulus E' of the hardened film at 20°C measured by dynamic thermomechanical analysis (DMTA) is 1.5 GPa or more. <P>COPYRIGHT: (C)2012,JPO&INPIT |
