| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus which can efficiently carry out substrate cleaning treatment and can reduce the installation space. <P>SOLUTION: A substrate cleaning apparatus comprises: a supply table 30; a recovery table 36; a plurality of washing treatment tanks 22, 24, and 26 which are arranged along a conveyance path extending from the supply table 30 to the recovery table 36, and which carry out a series of cleaning treatment steps for cleaning a substrate; temporary placement tables 32 and 34 which are arranged between the adjacent ones of the washing treatment tanks 22, 24, and 26; and a plurality of conveyance arms 44, 46, and 48 which convey racks 2, 4, 6, and 8 accommodating the substrate. Respective conveyance arms 44, 46, and 48 repeatedly carry out, in different zones of the conveyance path, a first operation for conveying the racks 2, 4, 6, and 8 accommodating the substrate from the supply table 30 or the temporary placement tables 32 and 34 to the washing treatment tanks 22, 24, and 26, and a second operation for conveying the racks from the washing treatment tanks 22, 24, and 26 to the temporary placement tables 32 and 34 or the recovery table 36. <P>COPYRIGHT: (C)2012,JPO&INPIT |
