| 摘要 |
An embedded vertical optical grating, a semiconductor device including the embedded vertical optical grating and a method for forming the same. The method for forming the embedded optical grating within a substrate includes depositing a hard mask layer on the substrate, patterning at least one opening within the hard mask layer, vertically etching a plurality of scallops within the substrate corresponding to the at least one opening within the hard mask layer, removing the hard mask layer, and forming an oxide layer within the plurality of scallops to form the embedded vertical optical grating. |
