发明名称 |
Method Of Aligning A Wafer Stage And Apparatus For Performing The Same |
摘要 |
In a method of aligning a wafer stage, the wafer stage may be moved in an X-axis direction. A first coordinate of the wafer stage may be measured from a first measurement position inclined to the X-axis. The wafer stage may be moved in a Y-axis direction. A second coordinate of the wafer stage may be measured from a second measurement position inclined to the Y-axis. Thus, a movement distance of the wafer stage may be increased, so that the interferometers may accurately measure the position of the wafer stage. |
申请公布号 |
US2012092638(A1) |
申请公布日期 |
2012.04.19 |
申请号 |
US201113221360 |
申请日期 |
2011.08.30 |
申请人 |
PARK TAE-JIN;KIM CHEOL-HONG;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK TAE-JIN;KIM CHEOL-HONG |
分类号 |
G03B27/58 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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