发明名称 LIGHT REFLECTING SUBSTRATE AND PROCESS FOR MANUFACTURE THEREOF
摘要 A light reflecting substrate comprises at least: an insulating layer and a metal layer disposed in contact with the insulating layer. The total reflectivity of light in the wavelength range of more than 320 nm and not more than 700 nm is not less than 50% and the total reflectivity of light in the wavelength range of 300 nm to 320 nm is not less than 60%. The light reflecting substrate further improves the emission power of the light-emitting device when used as the substrate therefor.
申请公布号 US2012091495(A1) 申请公布日期 2012.04.19
申请号 US201013380779 申请日期 2010.06.23
申请人 FUJIFILM CORPORATION 发明人 HATANAKA YUSUKE;HOTTA YOSHINORI;UESUGI AKIO
分类号 H01L33/60;C25D5/44;C25D7/00;G02B5/08 主分类号 H01L33/60
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