摘要 |
Embodiments of the present invention provide methods and apparatus for surface coatings applied to process chamber components utilized in chemical vapor deposition processes. In one embodiment, the apparatus provides a showerhead apparatus comprising a body, a plurality of conduits extending through the body, each of the plurality of conduits having an opening extending to a processing surface of the body, and a coating disposed on the processing surface, the coating being about 50 microns to about 200 microns thick and comprising a coefficient of emissivity of about 0.8, an average surface roughness of about 180 micro-inches to about 220 micro-inches, and a porosity of about 15% or less. |
申请人 |
APPLIED MATERIALS, INC.;HANAWA, HIROJI;MAUNG, KYAWWIN;CHUNG, HUA;CUI, JIE;BOUR, DAVID;HSU, WEI-YUNG;CHEN, LIANG-YUH |
发明人 |
HANAWA, HIROJI;MAUNG, KYAWWIN;CHUNG, HUA;CUI, JIE;BOUR, DAVID;HSU, WEI-YUNG;CHEN, LIANG-YUH |