ADJUSTMENT METHOD OF FREQUENCY CHARACTERISTICS, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To control the frequency characteristics of an on-chip antenna, produced on an Si semiconductor substrate having an inevitable parasitic capacitance together with an integrated circuit, freely to a desired value after wafer process manufacturing process.

SOLUTION: In the method of adjusting the frequency characteristics of an antenna in a semiconductor device having an integrated circuit and the antenna formed for an Si semiconductor substrate by a first process, a plurality of discontinuous conductive wire patterns are formed between the antenna and the integrated circuit in the first proces, the plurality of conductive wire patterns are selected partially or entirely after finishing the first process, and then a bonding wire is suspended so that the conductive wire patterns thus selected are arranged in series.

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