发明名称 RESISTIVE RAM DEVICES AND METHODS
摘要 The present disclosure includes a high density resistive random access memory (RRAM) device, as well as methods of fabricating a high density RRAM device. One method of forming an RRAM device includes forming a resistive element having a metal-metal oxide interface. Forming the resistive element includes forming an insulative material over the first electrode, and forming a via in the insulative material. The via is conformally filled with a metal material, and the metal material is planarized to within the via. A portion of the metal material within the via is selectively treated to create a metal-metal oxide interface within the via. A second electrode is formed over the resistive element.
申请公布号 WO2012002997(A3) 申请公布日期 2012.04.19
申请号 WO2011US01160 申请日期 2011.06.29
申请人 MICRON TECHNOLOGY, INC.;GREELEY, JOSEPH, N.;SMYTHE, JOHN, A. 发明人 GREELEY, JOSEPH, N.;SMYTHE, JOHN, A.
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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